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Influence of Metal-Graphene Contact on the Operation and Scalability of Graphene Field-Effect-Transistors

机译:金属 - 石墨烯接触对金属石墨烯的操作和可扩展性的影响   石墨烯场效应晶体管

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摘要

We explore the effects of metal contacts on the operation and scalability of2D Graphene Field-Effect-Transistors (GFETs) using detailed numerical devicesimulations based on the non-equilibrium Green's function formalismself-consistently solved with the Poisson equation at the ballistic limit. Ourtreatment of metal-graphene (M-G) contacts captures: (1) the doping effect dueto the shift of the Fermi level in graphene contacts, (2) the density-of-states(DOS) broadening effect inside graphene contacts due to Metal-Induced-States(MIS). Our results confirm the asymmetric transfer characteristics in GFETs dueto the doping effect by metal contacts. Furthermore, at higher M-G couplingstrengths the contact DOS broadening effect increases the on-current, while theimpact on the minimum current (Imin) in the off-state depends on the source todrain bias voltage and the work-function difference between graphene and thecontact metal. Interestingly, with scaling of the channel length, the MISinside the channel has a weak influence on Imin even at large M-G couplingstrengths, while direct source-to-drain (S -> D) tunneling has a strongerinfluence. Therefore, channel length scalability of GFETs with sufficient gatecontrol will be mainly limited by direct S -> D tunneling, and not by the MIS.
机译:我们使用基于非平衡格林函数形式主义的详细数值设备模拟,通过泊松方程在弹道极限处自洽地解决了金属接触对二维石墨烯场效应晶体管(GFET)的操作和可扩展性的影响。我们对金属-石墨烯(MG)接触的处理捕获:(1)由于石墨烯接触中费米能级的移动而产生的掺杂效应;(2)由于金属诱导的石墨烯接触内部的状态密度(DOS)扩展效应-状态(MIS)。我们的结果证实了由于金属触点的掺杂效应,GFET中的传输特性不对称。此外,在较高的M-G耦合强度下,接触DOS加宽效应会增加导通电流,而在截止状态下对最小电流(Imin)的影响取决于源极漏极偏置电压以及石墨烯与接触金属之间的功函数差。有趣的是,随着通道长度的缩放,即使在较大的M-G耦合强度下,通道内部的MIS对Imin的影响也较弱,而直接源极至漏极(S-> D)隧穿的影响更强。因此,具有足够栅极控制能力的GFET的沟道长度可扩展性将主要受到直接S-> D隧穿而不是MIS的限制。

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